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    Products >Physical/Chemical, Semiconductor Manufacturing Equipment  > Sputtering Equipment

Sputtering Equipment

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特徴

  • 2 or 3 inches Sputter Gun implemented as standard
  • Also available special sized Sputter Gun
  • Magnet type selection realizes Stable Electric Discharge
  • Lamp Heater or Sheathed Heater selectable for Substrate Heating
  • Max 3-inch substrate and Max 800℃ operation temperature ( special order)
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  • Efficient film deposition by automatic operation


Sputtering装置

 

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