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    Products >Physical/Chemical, Semiconductor Manufacturing Equipment  > PLD Equipment

PLD ( Pulsed Laser Deposition ) Equipment

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特徴

  • Heater source of laser, lamp, or sheathed-heater
  • Typical 2 inches Substrate size ( changeable by discussion )
  • Load-lock enables substrate and target to be changed in vacuum chambers
  • Automatic operation of target transfer and rotation
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PLD Equipment

 

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