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    Products >Physical/Chemical, Semiconductor Manufacturing Equipment  > EB ・RH Mixed Deposition Equipment

EB ・RH Mixed Deposition Equipment

PDF display Multi Vacuum Evaporation System
System for Composite Film Deposition and Various Deposition Films
Simple Design for Easy Operation

特徴

  • Mounted
    Dual Resistor Heating Evaporation Sources
    Triad Electric Beam Evaporation Source
  • Substrate Size : 30 × 30 mm
    Heating Temperature : 600 ℃
    Full rotation of 360 °
    High Uniformity available

 

EB RH DEposition Equipment

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