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Plasma Asher

PDF display Low Cost ・ R&D/Experiment Use
Suitable for MEMS ・ Device Etching

特徴

  • Barrel figured Batch Equipment
  • Resist Ashing by Plasma energy
  • Generated Plasma between internal electrodes activates Gas in vessel
  • Ashing by activated Gas irradiation
  • Dmageless and High rate Ashing by down flow gas injection and substrate heating

 

Plasma Asher Equipment

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