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Spray Coaters

PDFを表示 Available uniform resist coating to substrate cross/slope section
Equipment for development of MEMS/Micromachine

特徴

  • スプレーコータ装置 Available uniform resist coating to substrate cross/slope
    section by controlling stage and airflow
  • Available low-viscosity resist lamination to patterned
    substrate due to implemented high stiffness and
    high speed stage
  • Suitable for experimental/developmental use
  • Vacuum chucks including heater are standard
  • Available recipe registration of complicated procedure and parameter setting
    Easy operation helps to improve productivity/repeatability
  • Touch-panel display is adopted to control all functions
    and monitor the system

 

※ This product is jointly developed by Prof. Sasaki and Assoc. Prof. Kumagai at Toyota Technological Institute

 

Application

・Trial/Development/Mass-production of MEMS devices
・Thick Film Resist Coating
・Solid Wiring to Semiconductor, etc.
・Resist embedding and flattening
・Ashing for Photoresist
・Ashing for Organic Silicon Film

 

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