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    Products >Physical/Chemical, Semiconductor Manufacturing Equipment  > ICP-RIE Equipment

ICP-RIE Equipment

PDF display Low Cost・R&D/Experiment Use
Suitable for MEMS・Device Etching

特徴

  • Batch Equipment for Hyperfine Structural Etching based on ICP Discharge method
  • High Density Plasma on ICP Coil and Variable Frequency Power Supply of Bias Electrode provides Multiple Etching Condition
  • Independent Irradiate Ion Energy from Plasma Energy by Substrate Bias provides Precise Etching

 

CIP-RIE Equipment

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